Proceedings of the Eleventh International Symposium on Plasma Processing
It is also observed that the chamber pressure has the largest effect on the nitride etch rate a - a 5000 2.000 6000 2.000 ... In a separate experiment, given the same recipe but etched in the Applied Materials MxP clamp chamber, from which anbsp;...
| Title | : | Proceedings of the Eleventh International Symposium on Plasma Processing |
| Author | : | Electrochemical Society. Electronics Division |
| Publisher | : | The Electrochemical Society - 1996-01-01 |
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